Interference Lithography Using Laser with Tunable Wavelength

Type
Изобретение
ID
RU2629542
Author(s)
I.S. Balashov, A.A. Grunin, A.A. Fedianin, A.V. Chetvertukhin
Abstract
Device includes a laser radiation source, a slit diaphragm, a beam expander, and a sample holder with a mirror mounted thereon. A laser with a tunable wavelength is used as the laser radiation source. The beam expander consists of the collecting and diffusing lenses. The cutting line of the slit diaphragm is parallel to the intersection line of the mirror planes and the sample holder.
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